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This paper reviews the uses of X-ray Photoelectron Spectroscopy(XPS),
Auger Electron Spectroscopy, and Secondary Electron Microscopy(SEM) in
providing data about the effects of surface modification and
processing on various materials. Specifically, the surface processing
technique of most interes is Plasma Source Ion Implantation(PSII). A
description of PSII and of William and Mary's PSII system is provided
as well.
W. J. Kossler
2001-01-11