Plasma diagnostic techniques can be used to optimize different plasma process parameters, such as: sputtering, etching, and ashing. In this report, optical emission spectroscopy was used to analyze plasma species. A torsion balance was used to analyze momentum transfer and flux of a fast neutral source. Reported are the theoretical background, the design, the calibration methods and results of these techniques. Data regarding application to an inductively coupled plasma source are reported in a preliminary manner and further research must be done utilizing these diagnostic techniques.